Fully automatic wet bench
Fully automatic wet bench for the clean room with "foup" loading and unloading ports. The transportation of the wafers is "carrierless" to minimise chemical carryover.
- Etch and cleaning process for semiconductor- and solar industry
- Highest flexibility of process parameters
- Reduce cost of ownership
- High throughput at reduced footprint min 42m²/h silicon wafer
- Carrier less transport inside the tool to reduce chemical contamination between process bathes
- Different load and unload stations available. In this picture with FOUP docking and robot operation
- Modular design for highest flexibility and reduced maintenance
- Absolute process reliability
- Clean room class 100
